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1

The effect of dry passivation treatments on the corrosion resistance, moisture release and structure of the surface oxide film on electropolished stainless steel

Haruo Tomari, Fumihiro Satoh, Makoto Terada, Hiroshi Satoh, Tadahiro Ohmi, Yoshiyuki Nakahara

Journal:

Corrosion Science

Year:

1990

Language:

english

File:

PDF, 445 KB

english, 1990

2

[IEEE 2006 8th International Conference on Solid-State and Integrated Circuit Technology Proceedings - Shanghai, China (2006.10.23-2006.10.26)] 2006 8th International Conference on Solid-State and Integrated Circuit Technology Proceedings - Impact of improved mobility and low flicker noise MOS transistors using accumulation mode fully depleted silicon-on-insulator devices

Cheng, Weitao, Teramoto, Akinobu, Gaubert, Philippe, Hirayama, Masaki, Ohmi, Tadahiro

Year:

2006

Language:

english

File:

PDF, 189 KB

english, 2006

3

Modelling of the hole mobility in p-channel MOS transistors fabricated on (1 1 0) oriented silicon wafers

Philippe Gaubert, Akinobu Teramoto, Tadahiro Ohmi

Journal:

Solid-State Electronics

Year:

2010

Language:

english

File:

PDF, 907 KB

english, 2010

4

Gate oxide reliability concerns in gate-metal sputtering deposition process: an effect of low-energy large-mass ion bombardment

Takeo Ushiki, Mo-Chiun Yu, Kunihiro Kawai, Toshikuni Shinohara, Kazuhide Ino, Mizuho Morita, Tadahiro Ohmi

Journal:

Microelectronics Reliability

Year:

1999

Language:

english

File:

PDF, 258 KB

english, 1999

5

Inductively coupled plasma generator for an environmentally benign perfluorocarbon abatement system

Suzuki, Katsumasa, Ishihara, Yoshio, Sakoda, Kaoru, Shirai, Yasuyuki, Teramoto, Akinobu, Hirayama, Masaki, Ohmi, Tadahiro, Watanabe, Takayuki, Ito, Takashi

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2009

Language:

english

File:

PDF, 712 KB

english, 2009

6

Formation of metal silicide-silicon contact with ultralow contact resistance by silicon-capping silicidation technique

Yamada, Keiichi, Tomita, Kazuo, Ohmi, Tadahiro

Journal:

Applied Physics Letters

Year:

1994

Language:

english

File:

PDF, 523 KB

english, 1994

7

Intelligent electronic systems: Data flow path minimum processor for real-time response capability

Tadahiro Ohmi, Makoto Imai, Koji Kotani

Journal:

Electronics and Communications in Japan (Part II: Electronics))

Year:

1999

Language:

english

File:

PDF, 2.78 MB

english, 1999

8

Advanced scientific semiconductor processing based on high-precision controlled low-energy ion bombardment

Tadahiro Ohmi, Tadashi Shibata

Journal:

Thin Solid Films

Year:

1994

Language:

english

File:

PDF, 744 KB

english, 1994

9

High quality silicon nitride deposited by Ar/N2/H2/SiH4 high-density and low energy plasma at low temperature

Chuan Jie Zhong, Hiroaki Tanaka, Shigetoshi Sugawa, Tadahiro Ohmi

Journal:

Microelectronics Journal

Year:

2006

Language:

english

File:

PDF, 154 KB

english, 2006

10

Circuit level prediction of device performance degradation due to negative bias temperature stress

Rihito Kuroda, Akinobu Teramoto, Kazufumi Watanabe, Michihiko Mifuji, Takahisa Yamaha, Shigetoshi Sugawa, Tadahiro Ohmi

Journal:

Microelectronics Reliability

Year:

2007

Language:

english

File:

PDF, 382 KB

english, 2007

11

Characterization of MgZnO films grown by plasma enhanced metal-organic chemical vapor deposition

Hirokazu Asahara, Daiju Takamizu, Atsutoshi Inokuchi, Masaki Hirayama, Akinobu Teramoto, Shin Saito, Migaku Takahashi, Tadahiro Ohmi

Journal:

Thin Solid Films

Year:

2010

Language:

english

File:

PDF, 944 KB

english, 2010

12

High quality gate insulator film formation on SiC using by microwave-excited high-density plasma

Koutarou Tanaka, Hiroaki Tanaka, Akinobu Teramoto, Shigetoshi Sugawa, Tadahiro Ohmi

Journal:

Microelectronics Reliability

Year:

2007

Language:

english

File:

PDF, 186 KB

english, 2007

13

Accurate negative bias temperature instability lifetime prediction based on hole injection

Akinobu Teramoto, Rihito Kuroda, Shigetoshi Sugawa, Tadahiro Ohmi

Journal:

Microelectronics Reliability

Year:

2008

Language:

english

File:

PDF, 338 KB

english, 2008

14

Native Oxide Growth on Silicon Surface in Ultrapure Water and Hydrogen Peroxide

Morita, Mizuho, Ohmi, Tadahiro, Hasegawa, Eiji, Teramoto, Akinobu

Journal:

Japanese Journal of Applied Physics

Year:

1990

File:

PDF, 453 KB

1990

15

A New Microwave-Excited Plasma Etching Equipment for Separating Plasma Excited Region from Etching Process Region

Goto, Tetsuya, Hirayama, Masaki, Yamauchi, Hiroshi, Moriguchi, Makoto, Sugawa, Shigetoshi, Ohmi, Tadahiro

Journal:

Japanese Journal of Applied Physics

Year:

2003

Language:

english

File:

PDF, 159 KB

english, 2003

16

Examination of degradation mechanism due to negative bias temperature stress from a perspective of hole energy for accurate lifetime prediction

Kazufumi Watanabe, Akinobu Teramoto, Rihito Kuroda, Shigetoshi Sugawa, Tadahiro Ohmi

Journal:

Microelectronics Reliability

Year:

2007

Language:

english

File:

PDF, 347 KB

english, 2007

17

Densification of chemical vapor deposition silicon dioxide film using oxygen radical oxidation

Kawase, Kazumasa, Teramoto, Akinobu, Umeda, Hiroshi, Suwa, Tomoyuki, Uehara, Yasushi, Hattori, Takeo, Ohmi, Tadahiro

Journal:

Journal of Applied Physics

Year:

2012

Language:

english

File:

PDF, 670 KB

english, 2012

18

Still Image Compression with Adaptive Resolution Vector Quantization Technique

Nakayama, Takahiro, Konda, Masahiro, Takeuchi, Koji, Kotani, Koji, Ohmi, Tadahiro

Journal:

Intelligent Automation & Soft Computing

Year:

2004

Language:

english

File:

PDF, 1.14 MB

english, 2004

19

[IEEE Internet-Based Systems (SITIS 2011) - Dijon, France (2011.11.28-2011.12.1)] 2011 Seventh International Conference on Signal Image Technology & Internet-Based Systems - An Improved Face Recognition Algorithm Using Quantized DCT Coefficients

Chen, Qiu, Kotani, Koji, Lee, Feifei, Ohmi, Tadahiro

Year:

2011

Language:

english

File:

PDF, 380 KB

english, 2011

20

Region-Division Vector Quantization Histogram Method for Human Face Recognition

Kotani, Koji, Chen, Qiu, Lee, Feifei, Ohmi, Tadahiro

Journal:

Intelligent Automation & Soft Computing

Year:

2006

Language:

english

File:

PDF, 2.76 MB

english, 2006

21

[IEEE Internet-Based Systems (SITIS 2011) - Dijon, France (2011.11.28-2011.12.1)] 2011 Seventh International Conference on Signal Image Technology & Internet-Based Systems - A Robust Face Recognition Algorithm Using Markov Stationary Features and Adjacent Pixel Intensity Difference Quantization Histogram

Lee, Feifei, Kotani, Koji, Chen, Qiu, Ohmi, Tadahiro

Year:

2011

Language:

english

File:

PDF, 302 KB

english, 2011

22

[IEEE 2008 9th International Conference on Signal Processing (ICSP 2008) - Beijing, China (2008.10.26-2008.10.29)] 2008 9th International Conference on Signal Processing - VQ-based face recognition algorithm using code pattern classification and Self-Organizing Maps

Chen, Qiu, Kotani, Koji, Lee, Feifei, Ohmi, Tadahiro

Year:

2008

Language:

english

File:

PDF, 190 KB

english, 2008

23

/Si interface

Terada, Naozumi, Haga, Takashi, Miyata, Noriyuki, Moriki, Kazunori, Fujisawa, Masami, Morita, Mizuho, Ohmi, Tadahiro, Hattori, Takeo

Journal:

Physical Review B

Year:

1992

Language:

english

File:

PDF, 336 KB

english, 1992

24

LOW VOLTAGE 3 V OPERATION OF FERROELECTRIC MULTI-LAYER STACK MFIS STRUCTURE DEVICE FORMED BY PLASMA PHYSICAL VAPOR DEPOSITION AND OXYGEN RADICAL TREATMENT

TAKAHASHI, ICHIROU, SAKURAI, HIROYUKI, ISOGAI, TATSUFUMI, TERAMOTO, AKINOBU, SUGAWA, SHIGETOSHI, OHMI, TADAHIRO

Journal:

Integrated Ferroelectrics

Year:

2006

Language:

english

File:

PDF, 3.50 MB

english, 2006

25

Face Recognition Algorithm using Vector Quantization Codebook Space Information Processing

Ohmi, Tadahiro, Kotani, Koji, Chen, Qiu, Lee, Feifei

Journal:

Intelligent Automation & Soft Computing

Year:

2004

Language:

english

File:

PDF, 6.29 MB

english, 2004

26

52.4: Distinguished Paper : Electrical Properties of Amorphous InGaZnO Thin-Film Transistors Prepared by Magnetron Sputtering with Using Kr and Xe Instead of Ar

Goto, Tetsuya, Sugawa, Shigetoshi, Ohmi, Tadahiro

Journal:

SID Symposium Digest of Technical Papers

Year:

2013

Language:

english

File:

PDF, 889 KB

english, 2013

27

[IEEE 4th European Microwave Conference, 1974 - Montreux, Switzerland (1974.10.4-1974.10.6)] 4th European Microwave Conference, 1974 - Millimeter Wave Oscillations from Tunnett Diodes

Nishizawa, Jun-ichi, Ohmi, Tadahiro, Sakai, Toshi-aki

Year:

1974

Language:

english

File:

PDF, 5.08 MB

english, 1974

28

[IEEE 2008 9th International Conference on Signal Processing (ICSP 2008) - Beijing, China (2008.10.26-2008.10.29)] 2008 9th International Conference on Signal Processing - Face recognition based on the combination of histogram features and rough location information of facial parts

Lee, Feifei, Kotani, Koji, Chen, Qiu, Ohmi, Tadahiro

Year:

2008

Language:

english

File:

PDF, 557 KB

english, 2008

29

MFIS Structure Device with a Low Dielectric Constant Ferroelectric Sr 2 (Ta 1−x ,Nb x ) 2 O 7 Formed by Plasma Physical Vapor Deposition and Oxygen Radical Treatment

TAKAHASHI, ICHIROU, SAKURAI, HIROYUKI, ISOGAI, TATSUFUMI, FUNAIWA, KIYOSHI, HIRAYAMA, MASAKI, TERAMOTO, AKINOBU, SUGAWA, SHIGETOSHI, OHMI, TADAHIRO

Journal:

Integrated Ferroelectrics

Year:

2004

Language:

english

File:

PDF, 4.12 MB

english, 2004

30

[IEEE 2011 IEEE International Reliability Physics Symposium (IRPS) - Monterey, CA, USA (2011.04.10-2011.04.14)] 2011 International Reliability Physics Symposium - Understanding of traps causing random telegraph noise based on experimentally extracted time constants and amplitude

Abe, Kenichi, Teramoto, Akinobu, Sugawa, Shigetoshi, Ohmi, Tadahiro

Year:

2011

Language:

english

File:

PDF, 534 KB

english, 2011

31

[IEEE 2009 Second International Conference on Future Information Technology and Management Engineering (FITME) - Sanya, China (2009.12.13-2009.12.14)] 2009 Second International Conference on Future Information Technology and Management Engineering - A Modified Adjacent Pixel Intensity Difference Quantization Method for Face Recognition

Lee, Feifei, Kotani, Koji, Chen, Qiu, Ohmi, Tadahiro

Year:

2009

Language:

english

File:

PDF, 387 KB

english, 2009

32

[IEEE 2008 International Conference on Wavelet Analysis and Pattern Recognition (ICWAPR) - Hong Kong, China (2008.08.30-2008.08.31)] 2008 International Conference on Wavelet Analysis and Pattern Recognition - A VQ-based fast face recognition algorithm using optimized codebook

Qiu Chen,, Koji Kotani,, Fei-Fei Lee,, Tadahiro Ohmi,

Year:

2008

Language:

english

File:

PDF, 364 KB

english, 2008

33

[IEEE 2014 IEEE 17th International Conference on Computational Science and Engineering (CSE) - Chengdu, China (2014.12.19-2014.12.21)] 2014 IEEE 17th International Conference on Computational Science and Engineering - Face Recognition Using Markov Stationary Features and Vector Quantization Histogram

Chen, Qiu, Kotani, Koji, Lee, Feifei, Ohmi, Tadahiro

Year:

2014

Language:

english

File:

PDF, 361 KB

english, 2014

34

Very High Performance CMOS on Si(551) Using Radical Oxidation Technology and Accumulation-Mode SOI Device Structure

Cheng, Weitao, Teramoto, Akinobu, Ohmi, Tadahiro

Journal:

Journal of The Electrochemical Society

Year:

2010

Language:

english

File:

PDF, 447 KB

english, 2010

35

ECS Transactions [ECS 220th ECS Meeting - Boston, MA (October 9 - October 14, 2011)] - (Invited) High Power Normally-Off GaN MOSFET

Kambayashi, Hiroshi, Satoh, Yoshihiro, Kokawa, Takuya, Ikeda, Nariaki, Nomura, Takehiko, Kato, Sadahiro, Teramoto, Akinobu, Sugawa, Shigetoshi, Ohmi, Tadahiro

Year:

2011

Language:

english

File:

PDF, 1.24 MB

english, 2011

36

Photo Resist Stripping Using an Alkaline Accelerator Containing Wet-Vapor

Pantelides, Sokrates T., Ojima, Senri, Nitta, Takahisa, Miki, Nobuhiro, Ohmi, Tadahiro

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 381 KB

2001

37

Silicon Surface Cleaning for Low Temperature Silicon Epitaxial Growth

Mayuzumi, Masao, Imai, M., Nakahara, S., Inoue, Katsuya, Takahashi, J., Ohmi, Tadahiro

Journal:

Solid State Phenomena

Year:

1999

File:

PDF, 294 KB

1999

38

[IEEE 2008 International Conference on Wavelet Analysis and Pattern Recognition (ICWAPR) - Hong Kong, China (2008.08.30-2008.08.31)] 2008 International Conference on Wavelet Analysis and Pattern Recognition - An improved fast face recognition algorithm based on adjacent pixel intensity difference quantization histogram

Fei-Fei Lee,, Koji Kotani,, Qiu Chen,, Tadahiro Ohmi,

Year:

2008

Language:

english

File:

PDF, 482 KB

english, 2008

39

Potassium Adhesion to Various CVD Oxide and the Surface Cleaning with Hot UPW

Jizaimaru, T., Kanetaka, H., Omae, S., Ohmi, Tadahiro

Journal:

Solid State Phenomena

Year:

1999

File:

PDF, 240 KB

1999

40

Minimizing Wafer Surface Damage and Chamber Material Contamination in New Plasma Processing Equipment

Goto, Haruhiro, Sasaki, Makoto, Ohmi, Tadahiro, Shibata, Tadashi, Yamagami, Atsushi, Okamura, Nobuyuki, Kamiya, Osamu

Journal:

Japanese Journal of Applied Physics

Year:

1990

Language:

english

File:

PDF, 346 KB

english, 1990

41

[ECS 211th ECS Meeting - Chicago, Illinois (May 6-May 10, 2007)] ECS Transactions - Hot Carrier Instability Mechanism in Accumulation-Mode Normally-off SOI nMOSFETs and Their Reliability Advantage

Kuroda, Rihito, Teramoto, Akinobu, Cheng, Weitao, Sugawa, Shigetoshi, Ohmi, Tadahiro

Year:

2007

Language:

english

File:

PDF, 262 KB

english, 2007

42

SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Advances in Resist Technology and Processing XVII - Effect of surfactant-added developer on development of the chemically amplified photoresist

Kawada, Satoshi, Houlihan, Francis M., Tamai, Yukio, Omae, Shunkichi, Ohmi, Tadahiro

Year:

2000

Language:

english

File:

PDF, 831 KB

english, 2000

43

Association hardware for intelligent electronic systems

Tadahiro Ohmi, Tadashi Shibata, Koji Kotani, Tsutomu Nakai, Akira Nakada, Ning Mei Yu, Masahiro Konda, Tatsuo Morimoto, Yuichiro Yamashita

Journal:

Systems and Computers in Japan

Year:

1999

Language:

english

File:

PDF, 722 KB

english, 1999

44

Mass transfer of water vapor in a hollow fiber for degassing processes

Hideyuki Murata, Yasushi Tomita, Makoto Miyashita, Kazunari Sakai, Masayuki Toda, Tadahiro Ohmi

Journal:

Year:

1999

Language:

english

File:

PDF, 186 KB

english, 1999

45

Ultra-clean processing for ULSI

Journal:

Microelectronics Journal

Year:

1995

Language:

english

File:

PDF, 1.79 MB

english, 1995

46

4408304 Semiconductor memory

Jun-ichi Nishizawa, Ohmi Tadahiro, Takashige Tamamushi

Journal:

Microelectronics Reliability

Year:

1984

Language:

english

File:

PDF, 88 KB

english, 1984

47

Inverse dielectric relaxation effect of traveling carriers

Tadahiro Ohmi, Toshikazu Kodama

Journal:

Solid-State Electronics

Year:

1974

Language:

english

File:

PDF, 230 KB

english, 1974

48

Requirements of CAM in IC technology

Tadahiro Ohmi, Tadashi Shibata

Journal:

Microelectronic Engineering

Year:

1991

Language:

english

File:

PDF, 1.43 MB

english, 1991

49

Ultra clean processing

Journal:

Microelectronic Engineering

Year:

1991

Language:

english

File:

PDF, 1.10 MB

english, 1991

50

Silicon-silicon bonds in the oxide near the SiO2/Si interface

Naozumi Terada, Takashi Haga, Noriyuki Miyata, Kazunori Moriki, Masami Fujisawa, Mizuho Morita, Tadahiro Ohmi, Takeo Hattori

Journal:

Applied Surface Science

Year:

1992

Language:

english

File:

PDF, 221 KB

english, 1992